The aim of this study was to analyze the chemical composition and surface topography of commercially pure titanium implants, obtained from 03 trademarks frequently used in dentistry. There were 9 titanium implants of the following systems: SIN, P-I philosophy and Neodent. These materials were divided into 3 groups, with 3 implants in each group. Photoelectron Spectroscopy Excited by X-ray (XPS) was used to determine the chemical composition, while to characterize the surface topography we used Scanning Electron Microscopy (SEM). Titanium, carbon silicon and oxygen were identified in all samples analyzed. Other contaminants were: silicon, aluminum, sulfur, lead, phosphorus, calcium, sodium, nitrogen and carbon. We identified impurities on the surface of all implants analyzed. We consider necessary to development more studies relating the presence and concentration of these elements with the osseointegration process.
KEY WORDS: dental implants, titanium surface contaminants, XPS.
How to cite this article
MUÑANTE-CÁRDENAS, J. L. & LANDERS, R. Chemical and topographic analysis of dental implant surfaces using photoelectron spectroscopy and scanning electron microscopy: preliminary study. Int. J. Odontostomat., 6(3):355-361, 2012.